Analysis of Electrodeposited Nickel-Iron Alloy Film Composition Using Particle-Induced X-Ray Emission

Authors

Alyssa Frey, Hope College
Nicholas Wozniak, Hope CollegeFollow
Timothy Nagi, Hope CollegeFollow
Matthew Keller, Hope CollegeFollow
J. Mark Lunderberg, Hope CollegeFollow
Graham F. Peaslee, Hope CollegeFollow
Paul DeYoung, Hope CollegeFollow
Jennifer R. Hampton, Hope CollegeFollow

Document Type

Article

Publication Date

2011

Publication Source

International Journal of Electrochemistry

Volume Number

2011

First Page

604395

Publisher

SAGE-Hindawi

ISSN

2090-3529

Abstract

The elemental composition of electrodeposited NiFe thin films was analyzed with particle-induced X-ray emission (PIXE). The thin films were electrodeposited on polycrystalline Au substrates from a 100mM NiSO₄, 10 mM FeSO₄, 0.5M H₃BO₃, and 1M Na₂SO₄ solution. PIXE spectra of these films were analyzed to obtain relative amounts of Ni and Fe as a function of deposition potential and deposition time. The results show that PIXE can measure the total deposited metal in a sample over at least four orders of magnitude with similar fractional uncertainties. The technique is also sensitive enough to observe the variations in alloy composition due to sample nonuniformity or variations in deposition parameters.

Recommended Citation

Repository citation: Frey, Alyssa; Wozniak, Nicholas; Nagi, Timothy; Keller, Matthew; Lunderberg, J. Mark; Peaslee, Graham F.; DeYoung, Paul; and Hampton, Jennifer R., "Analysis of Electrodeposited Nickel-Iron Alloy Film Composition Using Particle-Induced X-Ray Emission" (2011). Faculty Publications. Paper 280.
https://digitalcommons.hope.edu/faculty_publications/280

Published in: International Journal of Electrochemistry, Volume 2011, January 1, 2011, pages 604395-. Copyright © 2011 SAGE-Hindawi. The final published version is available at: http://dx.doi.org/10.4061/2011/604395