Measurement of quasiparticle transport in aluminum films using tungsten transition-edge sensors

Authors

Jeffrey Yen, Stanford UniversityFollow
Benjamin Shank, Hope CollegeFollow
Betty Young, Santa Clara UniversityFollow
Blas Cabrera, Stanford UniversityFollow
Paul Brink, SLAC National Accelerator FacilityFollow
Matthew Cherry, SLAC National Accelerator FacilityFollow
John Mark Kreikebaum, Stanford UniversityFollow
Robert Moffatt, Stanford UniversityFollow
Peter Redl, Stanford UniversityFollow
Astrid Tomada, SLAC National Accelerator FacilityFollow
Ted Tortorici, Santa Clara UniversityFollow

Document Type

Article

Publication Date

10-21-2014

Publication Source

Applied Physics Letters

Volume Number

105

Publisher

American Institute of Physics

Comments

© 2014 AIP Publishing LLC Appl. Phys. Lett. 105, 163504 (2014); http://dx.doi.org/10.1063/1.4899130

Abstract

We report on experimental studies of phonon sensors which utilize quasiparticle diusion in thin aluminum films connected to tungsten transition-edge-sensors (TESs) operated at 35 mK. We show that basic TES physics and a simple physical model of the overlap region between the W and Al lms in our devices enables us to accurately reproduce the experimentally observed pulse shapes from x-rays absorbed in the Al films. We further estimate quasiparticle loss in Al lms using a simple diusion equation approach. These studies allow the design of phonon sensors with improved performance.

Recommended Citation

Yen, J. J., B. Shank, B. A. Young, B. Cabrera, P. L. Brink, M. Cherry, J. M. Kreikebaum, et al. “Measurement of Quasiparticle Transport in Aluminum Films Using Tungsten Transition-Edge Sensors.” Applied Physics Letters 105, no. 16 (October 20, 2014): 163504. doi:10.1063/1.4899130.